CLEVER

RC Extractor for Realistic 3D Structures

CLEVER is a physics-based RC extractor that uses GDSII mask data and process information to create a realistic 3D structure for MEMS, advanced CMOS, TFT, Memory cells, etc., using its built-in etch/deposit processor and optolithographical simulator. CLEVER back annotates extracted RCs into SPICE netlist.

Key Features

• True 3D field solver with advanced lithography and realistic etch deposition models resulting in the highest possible interconnect RC extraction accuracy
• No restriction on geometry size 65nm, 45nm and below
• Fast feedback for optimization of circuit performance as a function of back end process and layout parameters
• Solution based Adaptive Local Mesh Refinement creates an optimal mesh automatically for best accuracy and speed
• User selectable boundary condition, material property, and solution tolerance control
• Automatic back annotation of field solved resistances and capacitances onto extracted active device netlist for immediate SPICE analysis
• Only RC extractor in the industry capable of reproducing the lithographic effects of Optical Proximity Correction (OPC) sub wavelength effects, phase-shifts mask (PSM), misalignment, defocus, and delta (CD)

Rev. 020309_23