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MC Implant:

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MC Implant is a generic ion implantation simulator, which models ion stopping, defect generation, and ion implantation distributions in amorphous and crystalline materials. Extensive comparisons with measured profiles have shown that MC Implant is highly accurate and predictive. The simulator can be used for majority of ion/material combinations, arbitrary geometries, different substrate orientations, implant doses, energies and angles.

Rev. 042308_10