Volume 19, Number 3, July - August - September 2009

Third Generation Solar Cell Technologies: Localized Surface Plasmons

Solar cells are experiencing a surge in activity due to concerns about sustainability of non-renewable resources and the negative impacts of global warming due to human activity.

Vertical LOCOS (VLOCOS) power MOSFET structures are becoming increasingly popular [1-3] for 100 V rated applications due to their high packing density, superior temperature characteristics and low on-state resistance.

High Voltage Power Devices using super junction or multi RESURF effect have a relatively high BV with a drastic reduction in the on-state resistance (Ron)^[1-2]. Several Techniques such as buried multi-epitaxial growth^[3], Super Trench Power MOSFET process^[4], Vapor Phase Doping^[5] and trench filling epitaxial Si growth^[6], have been applied to formation of the high aspect ratio p/n column structures.

Texturing is often used to improve light trapping in thin film solar cells. The textured surfaces act to scatter the light in oblique angles lengthening the optical path and effectively trapping a greater percentage of light within the thin layers.

PDF Edition View this month's edition as a PDF file.	About Simulation Standard Background and publication schedule.
Archive Archives of previous editions all the way back to 1992